Celebrating their first year, the Center for Pattern Design will host a Pattern Design Conference to bring together master pattern makers who will share their insights, their designs and the pattern techniques that make them a critical part of the fashion industry.Keynote speaker will be Gail Gondek, pattern designer for Chado Ralph Rucci, Geoffrey Beene, Ralph Lauren, Marc Jacobs, and Peter Som. Her talk, Concept to Catwalk, will shed light on the often mysterious pattern design process that produces a fashion masterpiece at the highest levels. Her work has been shown at the Paris Couture and Prete-a-Porter shows and regularly at New York's Fashion Week for the past 20 years. Many of her pieces have also been displayed at the Metropolitan Museum of Art, the Museum of Modern Art, the Museum at the Fashion Institute of Technology, the Fashion Museum at Kent State University, and the Museum of Contemporary Art, Los Angeles (MOCA).
In addition to Ms. Gondek, other speakers include Julian Roberts, one of the most innovative designers in the UK and the inventor of Subtraction Cutting. He has shown 13 collections at London’s Fashion Week in addition to being a film maker for SuperSuper Magazine and a consultant to the BBC. Currently, he develops his own
collections, designing both the garment and the engineered surface designs. His film/web/graphics company, JULIANAND, is a leader in defining the visual identity of this century. Mr. Roberts will also be giving a rare Master Class in Subtraction Cutting at the Art Institute of California - San Francisco on October 2. A second Master Class will be offered by Suzy Furrer, owner of Apparel Arts in San Francisco, on October 4. It will feature her newly published benchmark text, Building Patterns, The Architecture of Women’s Clothes, in which she reveals the exact techniques of the French moulage system, used by couturiers, for drafting patterns that fit perfectly.
The program also includes Josh Jakus, Berkeley, CA architect, industrial designer and creator of the very unique UM bag, based upon the 1920’s Goode homolosine projection of the world map; Saundra Altman, owner of Past Patterns, the most accurate and extensively researched resource for historical patterns in the US; Isabelle Lott, creator of PWStudio software which enables an entrepreneur to create any pattern design with just a laptop; and Kathleen Poole, of Poole Fashion Group, speaking on Balancing Patterns, a little-known technique for creating the most commercially successful production patterns. Also, the Textile Clothing Technology Corp. (TC2), the fashion industry’s premier think tank based in Cary, North Carolina, will debut it’s new software, My ImageTwin, offering attendees a free digitally printed avatar of their bodies to assist in designing their personal clothing patterns. Plus, there will be a variety of pattern-related books, patterns and materials available for purchase and the inaugural issue of the Pattern Design Journal will be free to attendees.
The Center for Pattern Design is a membership organization which sponsors events with notable pattern and fashion designers, offers members an annual journal, a bi-monthly newsletter and special offers on courses and products. Those who join the Center will qualify for member prices for conference registration.
In addition to Ms. Gondek, other speakers include Julian Roberts, one of the most innovative designers in the UK and the inventor of Subtraction Cutting. He has shown 13 collections at London’s Fashion Week in addition to being a film maker for SuperSuper Magazine and a consultant to the BBC. Currently, he develops his own
collections, designing both the garment and the engineered surface designs. His film/web/graphics company, JULIANAND, is a leader in defining the visual identity of this century. Mr. Roberts will also be giving a rare Master Class in Subtraction Cutting at the Art Institute of California - San Francisco on October 2. A second Master Class will be offered by Suzy Furrer, owner of Apparel Arts in San Francisco, on October 4. It will feature her newly published benchmark text, Building Patterns, The Architecture of Women’s Clothes, in which she reveals the exact techniques of the French moulage system, used by couturiers, for drafting patterns that fit perfectly.
The program also includes Josh Jakus, Berkeley, CA architect, industrial designer and creator of the very unique UM bag, based upon the 1920’s Goode homolosine projection of the world map; Saundra Altman, owner of Past Patterns, the most accurate and extensively researched resource for historical patterns in the US; Isabelle Lott, creator of PWStudio software which enables an entrepreneur to create any pattern design with just a laptop; and Kathleen Poole, of Poole Fashion Group, speaking on Balancing Patterns, a little-known technique for creating the most commercially successful production patterns. Also, the Textile Clothing Technology Corp. (TC2), the fashion industry’s premier think tank based in Cary, North Carolina, will debut it’s new software, My ImageTwin, offering attendees a free digitally printed avatar of their bodies to assist in designing their personal clothing patterns. Plus, there will be a variety of pattern-related books, patterns and materials available for purchase and the inaugural issue of the Pattern Design Journal will be free to attendees.
The Center for Pattern Design is a membership organization which sponsors events with notable pattern and fashion designers, offers members an annual journal, a bi-monthly newsletter and special offers on courses and products. Those who join the Center will qualify for member prices for conference registration.
Contact information and registration for the conference, the opening reception on Oct. 2 and the Master Classes can accessed online at: www.centerforpatterndesign.org.
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